Within the past few years a lot of new special processes have developed in the plating industry. Due to the complexity of these processes a convenient power supply with individual pulse patterns is required.
The RPP-1 power supply was developed especially for the laboratory first contact and is therefore unbeatable as an initial model.
The easy menu-guided programming is carried out via a front-operated touchscreen. The RPP device is for DC, unipolar or bipolar operations. Furthermore, it is featured with 4 freely programmable segments starting with 1 ms pulse time. As an option, the RPP pulse device is also featured with a PC interface.
The RPP-1 was specially developed for the laboratory “first contact”. It is almost unbeatable as a low-cost entry-level model in compact form. Simple, menu-guided programming is carried out via a front-operated touch screen. The RPP offers DC operation, unipolar or bipolar operation and has 4 freely programmable segments starting with 1ms pulse time. Optionally, the RPP pulse unit can also be designed with a PC interface.
|Mains Voltage:||230 V +/- 10 %, 47-63 Hz|
|Rated DC Voltage:||10 VDC|
|Rated DC Current:||up to 50 ADC
up to 50 A forward,up to 50 A reverse
|Efficiency:||75 %…90 %|
|Ripple:||<1 % in relation to the rated value|
|Adjustment:||0…100 % of the output current / output voltage|
|Control Accuracy:||+/- 1 % in relation to the rated value|
|Ambient Temperature:||0…35 °C|